RF Power Systems

Trusted reliable multi frequency, matching network & synthesizer RF power systems with patented stability technologies

Our Radio Frequency (RF) power delivery solutions are utilised in applications from semiconductor fabrication, induction & dielectric heating through to industrial lasers, ultrasonic welding & surface modification. Our wide range of RF power supplies, or generators, combined with our expertise in impedance matching networks for optimum process performance provides a complete RF solution for end equipment applications.

Browse RF Power Products

Our RF Power capabilities

Our RF power delivery solutions range from 100W to 80kW with frequencies from 20kHz to 60MHz, tailored to the end equipment or process from our wide range of standard off the shelf generator and impedance matching network designs.

Experienced in a vast range of applications with complex loads, from plasma generation for deposition or etch in semiconductor fabrication to a range processes in healthcare and industrial applications, our solutions include fixed and frequency agile generators, pulse mode operation generators and auto-tuning, multi-tapped & fixed impedance matching networks. At XP Power we are solutions oriented supporting your system development needs with our specialist applications and engineering knowledge in Radio Frequency applications.

Our product portfolio includes high frequency (2MHz to 60MHz) generators from 600W to 80kW, low frequency (20kHz to 2MHz) generators from 3kW to 10kW, dual frequency (20kHz to 60MHz) generators with 500W to 1500W per output and auto tuning, multi-tap selectable and fixed impedance matching networks up to 60MHz to cover broad spectrum of system & process needs including pulse mode and frequency agile requirements.

Communications solutions include, analog interfaces, digital interfaces, DeviceNet and EtherCAT implementations to suit individual system needs and industry requirements

How can we help?

If you have any questions around RF products, including quote and RMA requests, get in touch with us - we are more than happy to help.

High Frequency RF Power Supplies

Our High Frequency RF Power Supplies are designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering, PECVD, and solar photovoltaic applications. Additional applications include induction and dielectric heating processes in industrial systems.

CB Series 

The CB series is the culmination of 45 years of RF plasma and heating experience. We have taken the proven rugged design of the CX series power amplifier section and combined it with all the innovation in DC supplies and diagnostics to make a compact, stable RF power supply without compromising reliability for size. These single frequency RF power supplies operate in the HF band (3.39MHz to 30MHz) still benefiting from XP Power’s “S” technology.

Performance

RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on XP Power's proven RF amplifier technology.

Features
  • Small, lightweight packaging
  • Standard fixed frequencies: 3.39 MHz to 30 MHz
  • Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
  • Designed to meet ETL and SEMI F47 directives
  • Forward or Delivered power mode regulation
Applications

The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering and PECVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Learn about Frequency Agile Tuning for High Performance RF Plasma Systems

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Learn about XP Power's Patented "S" Technology

Download technical article

Low Frequency RF Power Supplies

Our Low Frequency RF Power Supplies are designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering, PECVD, and solar photovoltaic applications. Additional applications include induction and dielectric heating processes in industrial systems.

CLB Series 

The CLB series incorporates all of the features and innovations developed in the previous CLF series with the added advantage of lighter weight and smaller size.

Performance

RF generators from the CLB product family are available in power ranges from 2500 to 12,000 Watts at a single frequency in the 20 kHz to 2 MHz band。 The Turbotune Technology within the unit allows frequency tuning by automatically varying its output frequency +/-10% around its nominal frequency。 The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership。 The design of the CLB series is based on XP Power's proven RF amplifier technology。。

Features
  • Small, lightweight packaging
  • Standard power ranges: 1250, 3000 Watts
  • Any single frequency from 20 kHz to 2 MHz, varying +/-10%
  • Phase lock tuning or software algorithm
  • Designed to meet ETL and SEMI F47 directives
  • Forward or Delivered power mode regulation
Applications

The CLB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Dual Frequency RF Generators & Power Supplies

CDX Series

  • Simplify Operations and Reduce Costs Without Sacrificing Performance
  • Compact packaging reduces space, service (electrical and plumbing), and spare inventory requirements.
Performance

The CDX dual frequency RF generator is offered in a design up to a 3000 watts。 The high frequency (HF) section of the CDX provides up to 1500 watts of power, with optional frequencies from 2 to 60 MHz。 The low frequency (LF) section can deliver 1500 watts, with optional fixed or variable frequencies ranging from 20 kHz to our new 13。56 MHz。 It can be configured as two LF sections or two HF sections or one HF and one LF section。

Features
  • Complies to CE-Mark standards and is ETL Marked and SEMI F47 compliant
  • Protection circuits safeguard the amplifiers from over-voltage, over-current and over-power operating conditions
  • Gain-control circuitry stabilizes output power against line and load variations, and limits power during high VSWR conditions
  • Unique power monitoring in the low-frequency section measures delivered power into any impedance load
  • Optional fast frequency tuning available in the low- frequency section eliminates the need for a matching network in many applications
Applications

Applications include etch, ICP, RF sputtering, PECVD, and solar photovoltaic applications。 Additional applications include induction and dielectric heating processes in industrial systems

Impedance Matching Networks

Match Pro Matching Networks

  • Fast Tuning and Fine Tune Resolution Deliver Repeatable Process Results
  • Custom Designs to Fit Your Specific Application
Performance

All Match Pro impedance matching networks are engineered with XP Power's unique PROTRAK, a high-speed tuning algorithm that gradually slows the system as it approaches the tuning point, allowing a precise match even in high "Q" loads。 This proportional control circuitry illustrates the critical difference between XP Power's Match Pro and other matching networks。 The Match Pro adjusts input impedance to 50 Ohms quickly, accurately and dependably—in response to the changes in load characteristics during your process。 The Match Pro operates over a power range from 50 to 50,000 Watts。

Features
  • Automatic and manual modes with local and remote manual control of tuning capacitors
  • Ability to pre-position capacitors to optimal plasma ignition point prior to turn on, resulting in quick and reliable tuning
  • Capacitor position outputs to show where the match occurs from process to process
  • High power, H-bridge, Mosfet motor drive circuitry is conservatively rated for improved reliability
  • Optional BLDC motors and drive for improved motor life cycle
  • Optional DC Bias and RF VP-P detector circuits available

Industries

 
Semiconductor

Our comprehensive portfolio of RF power solutions serve as critical components in a variety of manufacturing applications by providing the higher power and frequencies required in today’s precise processes。

  • Precise RF control to monitor and control any measurable process variable including: delivered power, DC bias voltage, RF current, etc.
  • Instantaneous response to fluctuating power demands
  • Fast pulsing and frequency shifting
  • High quality, stable proven power
  • Etching
  • Deposition
  • LED Processing
  • Silicon Refining
  • Solar Thin Film
  • 20KHz to 100 MHz in solid state up to 10KW
  • Flexibility to adapt to cutting-edge manufacturing practices
  • Ability to retrofit into older production methods
  • High frequency power supplies up to 2MHz
 
Induction Heating

Our comprehensive portfolio of RF power solutions serve as critical components in a variety of manufacturing applications by providing:

  • Precise RF control regulated on any measurable process variable including: temperature, frequency, voltage, current, etc.
  • Rapid response to fluctuating power demands
  • Flexibility to adapt to cutting-edge manufacturing practices
  • Ability to retrofit into older production methods
  • High quality, stable and repeatable power
  • Frequency tuning available to rapidly tune to changing load.

Metal Hardening and Tempering

The induction hardening and tempering processes lowers costs, increases production, enhances quality control and improves the environment of the workplace. Since heat is generated within the component, the heat is confined to selected area and allows control of heated depth, time, power and temperature. The process is energy efficient, repeatable and easily fits into existing product lines.

XP Power offers a wide range of power supplies from 20KHz to 80MHz, and 200W to 80KW.

 
Advanced Materials

XP Power has provided RF power supplies for plasma torch and plasma discharge from 200W to 80KW for production of nanoparticles, ceramic deposition and atomic layer deposition (ALD).

Our comprehensive portfolio of RF power solutions serve as critical components in a variety of manufacturing applications by providing:

  • Precise RF control regulated on any measurable process variable including: temperature, frequency, voltage, current, etc.
  • Rapid response to fluctuating power demands
  • Flexibility to adapt to cutting-edge manufacturing practices
  • Ability to retrofit into older production methods
  • High quality, stable and repeatable power
 
Laser

Our comprehensive portfolio of RF power solutions serve as critical components in a variety of manufacturing applications by providing:

  • Precise RF control regulated on any measurable process variable including: temperature, frequency, voltage, current, etc.
  • Rapid response to fluctuating power demands
  • Flexibility to adapt to cutting-edge manufacturing practices
  • Ability to retrofit into older production methods
  • High quality, stable and repeatable power
 
Dielectric Heating

The loads of dielectric heating processes require optimized RF power levels with on-demand frequency and accurate power control for improved process control.

Our comprehensive portfolio of RF power solutions serve as critical components in a variety of manufacturing applications by providing:

  • Precise RF control regulated on any measurable process variable including: temperature, frequency, voltage, current, etc.
  • Rapid response to fluctuating power demands
  • Flexibility to adapt to cutting-edge manufacturing practices
  • Ability to retrofit into older production methods
  • High quality, stable and repeatable power
  • Frequency Tuning available to rapidly tune to changing loads
  • Arc Shutdown to prevent tooling and product damage

Baking

RF heating is used with conventional baking ovens to remove the final moisture of partially dried bakery products, such as breakfast cereals, crackers, biscuits and sponge cake, as well as to increase the production capacity of existing baking ovens。 Bakers use RF to better control the final moisture content of their products, to reduce checking problems, to increase productivity and to improve product quality。

Cooking

Radio frequency (RF) cooking is a form of dielectric heating in which products are heated by subjecting them to an alternatingelectromagnetic field between two parallel electrodes。 Although similar in some respects to Microwave heating, RF technology has been proposed to be more suitable for industrial heating of meats because of the greater uniformity of heating, the greater penetration depths it achieves and the decreased need for shielding。

Drying

High frequency drying is an efficient process for the removal of moisture from textiles, lumber and plywood. It is also used in the wood industry for embossing, forming or laminating to fiberboard for OSB and chip board curing and for curing glue to accelerate drying time.

Glass Lamination

Radio-frequency dielectric heating to directly heat the polymer interlayers that are used to laminate glass for automotive windshields, hurricane e glass, safety glass, solar panels, and transparent armor。 The direct heating virtually eliminates provides an energy savings of 90% over other methods。

Wood Lamination

XP Power offers precise power control in a wide range of frequencies。